Electrolysis: processes – compositions used therein – and methods – Electrolytic material treatment – Metal or metal alloy
Patent
1998-09-25
2000-08-15
Bell, Bruce F.
Electrolysis: processes, compositions used therein, and methods
Electrolytic material treatment
Metal or metal alloy
205730, 205733, 205738, 205740, 20419601, 20419604, 20419611, 20419615, 20419626, 20419637, 20419638, 20419616, C23F 1300
Patent
active
06103097&
ABSTRACT:
Control of lead contamination in residential water supplies is accomplished by cathodic protection of lead-containing piping and lead-containing fixtures. Specifically, a partially insulated wire is inserted into lead-containing service lateral piping. Application of a DC current to the partially insulated wire causes the wire to act as an anode and transforms the walls of the pipe into the cathode, thereby protecting against corrosion. Alternatively, a sacrificial anode is inserted into a lead-containing fixture. The electrical potential generated by corrosion of this sacrificial anode transforms the walls of the fixture into a cathode, thereby preventing corrosion. Carbonate scaling built-up prior to the initiation of cathodic protection may be removed by temporarily blocking the water pipe and introducing cleaning chemicals.
REFERENCES:
patent: 1842541 (1932-01-01), Cumberland
patent: 3689395 (1972-09-01), Blount et al.
patent: 4457821 (1984-07-01), Sudrabin et al.
patent: 4826577 (1989-05-01), Lange
patent: 4855029 (1989-08-01), Gazda et al.
patent: 4975560 (1990-12-01), Wardy
patent: 4990231 (1991-02-01), Stewart et al.
patent: 5006214 (1991-04-01), Burchnell et al.
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