Method and apparatus for laser-induced CVD

Details Method and apparatus for laser-induced CVD Method and apparatus for laser-induced CVD

1987-02-03

1988-03-22

Newsome, John H.

Coating processes

Electrical product produced

Welding electrode

118620, 118723, 427 541, B05D 306

Patent

active

047327936

ABSTRACT:
A laser-induced CVD method in accordance with this invention comprises the steps of: setting a substrate in a reactive gas; applying a laser beam to the reactive gas to decompose it and produce not only free radicals but also ions due to multiphoton absorption; and applying an electric field thereby to efficiently transport the ions toward the substrate and deposit a thin film on the substrate at an increased deposition rate.

REFERENCES:
patent: 4649059 (1987-03-01), Eden et al.
"Laser-Induced Chemical Vapor Deposition of SiO.sub.2 ", P. K. Boyer et al, Appl. Phys. Lett., vol. 40, 1982, pp. 716-718.

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