Method and apparatus for isolating defects in an integrated circ

Details Method and apparatus for isolating defects in an integrated circ Method and apparatus for isolating defects in an integrated circ

1997-12-17

1999-11-09

Le, Que T.

Radiant energy

Photocells; circuits and apparatus

With circuit for evaluating a web, strand, strip, or sheet

25055945, 3562374, G01N 2186

Patent

active

059819677

ABSTRACT:
An apparatus for isolating defects in an integrated circuit using near field scanning photon emission microscopy comprises a photon collector 10 which receives emitted photons 16 from a surface 14 of an energized or biased integrated circuit 12, a CCD camera 20 for converting the photons into an emission image 22, and an optical fiber 18 coupling the CCD camera 20 to the photon collector 10, so that the optical fiber transmits photons from the collector to the CCD camera. As a result, defects in integrated circuits can be isolated with greater resolution than currently available using conventional far field photon emission microscopy.

REFERENCES:
patent: 5235400 (1993-08-01), Terasawa et al.
KLA 1620 Emmission Microscope for Multilayer Inspection, Operation's Manual, Revision A. Software Version 2.0, Jun. 1990. (No page #).
"Near-field optical microscope break the diffraction limit," by Pat Moyer and Tim Van Slambrouck, Laser Focus World, TropMetrix, four pagee. (No date).
"IC Failure Analysis Using Real-time Emission Microscopy," by Tom Adams, Semiconductor International, two pages (No date).
"Super Resolution Imaging Spectroscopy," by T.D. Harris, R.D. Grober, J.K. Trautman, and E. Betzig, Applied Spectroscopy, vol. 48, No. 1, 1994, pp. 14A thru 21A (Month unknown).
"IC Failure Analysis: Techniques and Tools for Quality and Reliability Improvement," by Jerry M. Soden and Richard E. Anderson, Proceedings of the IEEE, vol. 81, No. 5, May 1993, pp. 703 thru 715.

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