Method and apparatus for interferometric measurement of...

Details Method and apparatus for interferometric measurement of... Method and apparatus for interferometric measurement of...

2007-05-22

2007-05-22

Tootley, Jr., Gregory J. (Department: 2877)

Optics: measuring and testing

By light interference

For dimensional measurement

Reexamination Certificate

active

11201859

ABSTRACT:
Methods and apparatus that combine the techniques of reversal (or self-calibration) to provide a low spatial frequency measurement of a part shape, independent of systematic errors in the staging used to move the part and small aperture interferometry to provide high spatial frequency information on a large part. The low spatial frequency is used to establish the rigid body motions (e.g., tip, tilt, and piston for a plano object) to be applied to the individual sub-apertures of interferometric data in stitching them together to give a full map at high resolution of the whole part. No overlap between sub-apertures is required.

REFERENCES:
patent: 5960379 (1999-09-01), Shimizu et al.
patent: 6611791 (2003-08-01), Kase et al.
patent: 6822745 (2004-11-01), De Groot et al.
patent: 6956657 (2005-10-01), Golini et al.
patent: 2001/0043333 (2001-11-01), Groot et al.
patent: 2003/0117632 (2003-06-01), Golini et al.
Evans, Christopher J., “Self-calibration: reversal, redundancy, error separation, and “absolute testing””, CIRP Annals, vol. 45/2 (1996), pp. 617-634.
Bray, M., “Stitching interferometer for large plano optics using a standard interferometer”, Proc SPIE vol. 3134 (1997), pp. 39-50.
Griesmann U., et al., “Measuring Form and Radius of Spheres with Interferometry”, CIRP Annals, vol. 53/1 (2004), pp. 451-454.
Assoufid, L., et al., “3-D surface profile measurements of large x-ray synchrotron radiation mirrors using stitching interferometry”, Proc. SPIE vol. 4782 (2002), p. 21-28.

Affiliated with

Also associated with

Rating

Method and apparatus for interferometric measurement of... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for interferometric measurement of..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for interferometric measurement of... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3721193