Method and apparatus for inspecting process performance for...

Details Method and apparatus for inspecting process performance for... Method and apparatus for inspecting process performance for...

2007-12-20

2010-06-15

Dole, Timothy J (Department: 2831)

Electricity: measuring and testing

Impedance, admittance or other quantities representative of...

Lumped type parameters

C324S464000, C156S345240

Reexamination Certificate

active

07737706

ABSTRACT:
A method inspects a process performance of a capacitively coupled plasma processing apparatus which generates a plasma for a plasma processing by applying a radio frequency power between a first electrode and a second electrode disposed in a processing vessel to face the first electrode in parallel. The method includes measuring an impedance of a radio frequency transmission path ranging from a rear surface of the first electrode to a ground potential part and sweeping a frequency to thereby obtain a frequency characteristic of a real resistance component of the impedance; reading a specific property value of a horn-like peak which appears from the frequency characteristic of the real resistance component; and determining efficaciousness or inferiority of the process performance of the plasma processing apparatus based on the peak property value.

REFERENCES:
patent: 6424232 (2002-07-01), Mavretic et al.
patent: 6929712 (2005-08-01), Hanazaki et al.
patent: 2002-124400 (2002-04-01), None
patent: 2005-109183 (2005-04-01), None

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