Method and apparatus for inspecting patterns composed of reticle

Details Method and apparatus for inspecting patterns composed of reticle Method and apparatus for inspecting patterns composed of reticle

1995-03-17

1998-07-14

Moore, David K.

Image analysis

Applications

Manufacturing or product inspection

382147, 382145, G06K 900

Patent

active

057816565

ABSTRACT:
A method and apparatus for inspecting patterns of reticle data includes carrying out a sizing process in which source data for designing a given device are combined with each other; carrying out a slit filling process in which any slit, that may occur in patterns obtained by the sizing process and is unconformable to a predetermined rule, is deleted by enlarging and reducing patterns; separately storing patterns obtained by the sizing process and patterns obtained by the slit filing process; carrying out a logical operation for patterns obtained by the sizing process and patterns obtained by the slit filling process; storing patterns obtained by logical operation as graphic patterns; detecting patterns each having dimensions equal to or smaller than the predetermined value on the basis of coordinates of the graphic patterns; and deeming the thus detected patterns to be false defect patterns and distinguishing false defect patterns from true defect patterns.

REFERENCES:
patent: 5046109 (1991-09-01), Fujimori et al.

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