Method and apparatus for inspecting pattern defects

Details Method and apparatus for inspecting pattern defects Method and apparatus for inspecting pattern defects

2007-05-15

2007-05-15

Pham, Hoa Q. (Department: 2877)

Optics: measuring and testing

Inspection of flaws or impurities

Surface condition

C356S237500

Reexamination Certificate

active

10223422

ABSTRACT:
A pattern defect inspection apparatus is capable of detecting defects, without being affected by non-uniform thickness of a thin film formed on a sample, even when using monochromatic light, such as a laser. The apparatus comprises a laser to illuminate a sample, coherence suppression optics to reduce laser beam coherence, a condenser to condense the laser beam onto a pupil plane of an objective lens, and a detector to detect the light reflected from a circuit pattern formed on a sample. The condenser is designed so that the intensity of light illuminating the sample under test can be partially adjusted according to the type of laser beam illumination condensed on the pupil of the objective lens. Variations in reflected light intensity caused by non-uniform film thickness on the surface of the sample are therefore reduced, and shading is minimized in the detected image to allow detecting of fine defects.

REFERENCES:
patent: 4812748 (1989-03-01), Brust et al.
patent: 4930896 (1990-06-01), Horikawa
patent: 5649022 (1997-07-01), Maeda et al.
patent: 5764363 (1998-06-01), Ooki et al.
patent: 5774222 (1998-06-01), Maeda et al.
patent: 5932871 (1999-08-01), Nakagawa et al.
patent: 5981956 (1999-11-01), Stern
patent: 6091075 (2000-07-01), Shibata et al.
patent: 6437862 (2002-08-01), Miyazaki et al.
patent: 6800859 (2004-10-01), Shishido et al.

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