Method and apparatus for inspecting a surface

Details Method and apparatus for inspecting a surface Method and apparatus for inspecting a surface

2007-12-18

2009-10-13

Evans, F. L (Department: 2877)

Optics: measuring and testing

Inspection of flaws or impurities

Surface condition

C356S237500

Reexamination Certificate

active

07602481

ABSTRACT:
A method and an apparatus for inspecting a surface of a wafer disclosed. At least one incident-light illuminator is provided to illuminate an area of the surface of the wafer in a first and a second illumination mode, in particular a bright-field and a dark-field illumination. At least one image detector is provided to detect an image of the illuminated area. A storage device is used for storing values on the intensity and the color of an optimized illumination of each incident-light illumination mode.

REFERENCES:
patent: 2005/0134839 (2005-06-01), Kreh et al.
patent: 2005/0168729 (2005-08-01), Jung et al.

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