Method and apparatus for infrared sensing of gas

Measuring and testing – Gas analysis – With compensation detail

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

73 2402, 73 3105, 250343, G01N 2161

Patent

active

060678402

ABSTRACT:
A gas sensor (10) is shown having alternately energized infrared radiation sources (14, 16) disposed in a gas chamber (12) at different distances from an infrared detector (18). Both radiation sources are filtered at the absorbing wavelength of a gas to be monitored with one radiation source located proximate to the detector serving as a "virtual reference". The differential absorption between the two radiation sources is used to determine the concentration of a gas being monitored. In a modified sensor (30) one radiation source is seated in a parabolic recess (34a) in a base plate (34) with the radiation focused on one angled end wall (32d) of a dished shaped cover member (32) and reflected over to a second angled end wall (32e) and into the detector with the radiation sources and the detector attached directly to a circuit board (24) mounting the sensor. The recessed cover with opposed angled end walls is also used with another embodiment in which the radiation sources are both located the same distance from the detector, are alternately energized and are filtered with sensing and reference filters, respectively. A modified embodiment (50) has a concave end wall (32e') vertically aligned with the detector and another embodiment (60) has an additional detector (18') along with a semi-reflective, semi-transmitting optical baffle (32k) for use with a gas having a higher absorption level. This embodiment also shows cover member (32") received directly on circuit board (24') with no intermediate base plate.

REFERENCES:
patent: 4412445 (1983-11-01), Spellicy
patent: 4899053 (1990-02-01), Lai
patent: 5163332 (1992-11-01), Wong
patent: 5384640 (1995-01-01), Wong
patent: 5696379 (1997-12-01), Stock
Patent Abstracts of Japan, vol. 011, No. 375 (P-644), Dec. 8, 1987 & JP 62 145143 A (Yokogawa Electric Corp), Jun. 29, 1987.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method and apparatus for infrared sensing of gas does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for infrared sensing of gas, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for infrared sensing of gas will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1902385

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.