Radiant energy – Irradiation of objects or material
Patent
1985-04-01
1987-05-12
Anderson, Bruce C.
Radiant energy
Irradiation of objects or material
2504922, 250424, 55117, H05H 100
Patent
active
046653155
ABSTRACT:
A method and apparatus for in-situ cleaning of charged particle beam optical systems such as electron microscopes, electron beam lithography systems, ion beam microscopes or lithography systems, through the use of a specially introduced plasma forming gas such as hydrogen that is excited by applying a high voltage, high frequency excitation potential between various optical elements of the electron beam optical column. Alternately, specially constructed separate plasma forming electrodes can be built into the electron beam optical system for this purpose. During the cleaning operation the plasma reacts chemically with the contaminants previously formed on the surface of the electron beam column optical elements to form gaseous reactants which then are pumped out of the electron beam column system.
REFERENCES:
patent: 2985756 (1961-05-01), Holland
patent: 4344019 (1982-08-01), Gavin et al.
patent: 4362936 (1982-12-01), Hoffman et al.
patent: 4496843 (1985-01-01), Kirita et al.
Bacchetti Lawrence F.
Smith Donald O.
Walker David M.
Anderson Bruce C.
Control Data Corporation
Guss Paul A.
Helzer Charles W.
LandOfFree
Method and apparatus for in-situ plasma cleaning of electron bea does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method and apparatus for in-situ plasma cleaning of electron bea, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for in-situ plasma cleaning of electron bea will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1804425