Method and apparatus for in situ cleaning of excimer laser optic

Details Method and apparatus for in situ cleaning of excimer laser optic Method and apparatus for in situ cleaning of excimer laser optic

1989-06-26

1991-03-26

Schmidt, Frederick R.

Abrasive tool making process, material, or composition

With carbohydrate or reaction product thereof

51322, 51411, 51284R, 134 7, 372109, 372 57, B24B 100, B24C 100, B08B 700, H01S 300

Patent

active

050018736

ABSTRACT:
A method and apparatus for cleaning the optical elements in an excimer laser in situ. A source of high pressure carbon dioxide gas is allowed to escape through a nozzle facing the surface of the optical elements. The escaping gas expands and cools sufficiently to form a carbon dioxide ice jet. The ice jet strikes the surface of the optical elements causing cleaning of the elements by abrasion. Carbon dioxide may be removed merely by evacuation and purging of the system. Thus the mirrors are cleaned without removing them.

REFERENCES:
patent: 3731227 (1973-05-01), Rosenberger et al.
patent: 4052680 (1977-10-01), Wang et al.
patent: 4631250 (1986-12-01), Hayashi
patent: 4718071 (1988-01-01), Steffen
patent: 4806171 (1989-02-01), Whitlock et al.
Patent Abstracts of Japan, vol. 12, No. 211 (E-622)[3058], Jun. 16, 1988; & JP-A-63 9171 (Komatsu), Jan. 14, 1988.
Patent Abstracts of Japan, vol. 12, No. 211 (E-622)[3058], Jun. 16, 1988; & JP-A-63 9175 (Komatsu), Jan. 14, 1988.
Patent Abstracts of Japan, vol. 11, No. 400 (E-569)[2847], Dec. 26, 1987; & JP-A-62 160 799 (Nippon Kogaku), Jul. 16, 1987.

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