X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Patent
1994-01-31
1995-05-09
Porta, David P.
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
378 72, 378 83, G01N 23207
Patent
active
054147476
ABSTRACT:
An accurate, real-time method for monitoring and analyzing crystalline specimens having polycrystalline platings. The method is capable of individual or simultaneous analysis of any combination of the following: 1) composition of the substrate and plating (even when the plating and substrate having common elements); 2) analysis of thickness of the plating(s); 3) analysis of the depth of the plating(s), e.g., the thickness of any overlay; 4) analysis of the crystalline phase depth simultaneous with phase composition; 5) the preferred crystalline orientation; 6) the strain in the substrate; and (7) crystallinity and grain size. The apparatus is similar to that of U.S. Pat. No. 5,148,458 issued to Ruud, with the apparatus of this invention having the several detectors placed on different arcs and/or radial distances from the specimen surface under investigation.
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Jacobs Mark E.
Ruud Clayton O.
Greer, Jr. Thomas J.
Porta David P.
The Penn State Research Foundation
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