Method and apparatus for immersion lithography

Details Method and apparatus for immersion lithography Method and apparatus for immersion lithography

2007-05-29

2007-05-29

Mathews, Alan (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S030000, C355S072000, C355S077000

Reexamination Certificate

active

11174103

ABSTRACT:
A method and apparatus for immersion lithography is described. The method includes positioning a semiconductor substrate under an optical immersion head assembly, providing an immersion liquid between the substrate and the optical immersion head assembly, and supplying a tensio-active gaseous substance along the perimeter of the contact area of the immersion liquid and the substrate. The immersion liquid contacts at least an area of the substrate. The tensio-active gaseous substance is chosen such that, when at least partially mixed with the immersion liquid, the mixture has a lower surface tension than the immersion liquid, thereby creating a surface tension gradient pulling the immersion liquid from the perimeter towards an inside portion of the contact area.

REFERENCES:
patent: 5660642 (1997-08-01), Britten
patent: 6867844 (2005-03-01), Vogel et al.
patent: 2004/0075895 (2004-04-01), Lin
patent: 1 420 298 (2004-05-01), None
patent: WO 2005/003864 (2005-01-01), None
European Search Report for PCT application of Interuniversitair Micro-Elektronica Centrum, EP 05 44 7154 dated Mar. 16, 2006.
Immersion Lithography; its potential performance and issues, Optical Microlithography XVI, Anthony Yen, Editor, Proceedings of SPIE, vol. 5040 (2003), pp. 724-733.
Jalal J. Jafar and Peter M. Budd,Separation of alcohol/water mixtures by pervaporation through zeolite A membranes, Microporous Materials 12 (1997), pp. 305-311.

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