Method and apparatus for immersion cleaning of semiconductor dev

Details Method and apparatus for immersion cleaning of semiconductor dev Method and apparatus for immersion cleaning of semiconductor dev

1998-06-29

2000-02-08

Stinson, Frankie L.

Cleaning and liquid contact with solids

Apparatus

With plural means for supplying or applying different fluids...

134902, 1341021, 134110, 134 19, B08B 304

Patent

active

06021791&

ABSTRACT:
Method and apparatus for cleaning semiconductor devices and other workpieces using an aqueous rinse solution which is de-oxygenated by passing the aqueous rinse solution and a carrier gas through an osmotic membrane degasifier. A cleaning chamber is also disclosed for carrying out the cleaning method.

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