Coating processes – Coating by vapor – gas – or smoke
Reexamination Certificate
2006-06-02
2011-10-18
Gambetta, Kelly M (Department: 1715)
Coating processes
Coating by vapor, gas, or smoke
C427S569000, C427S255110
Reexamination Certificate
active
08039051
ABSTRACT:
A method and apparatus is provided for hydrogenation of a target, such as a polycrystalline silicon film on a glass substrate, by using an atomic hydrogen source. The target is subjected to intermittent exposure of the atomic hydrogen field of the source until at least one area of the target has been subjected to the hydrogen field for a predetermined minimum period of time. The processing area of the source established by its atomic hydrogen field is smaller than the target, and after the target is moved into the high temperature processing zone it is translated within the high temperature processing zone to intermittently process successive areas of the target until the entire target has been processed for a predetermined minimum period of time. After the entire target has been processed, the target is cooled to a predetermined lower temperature while still intermittently subjecting the target to atomic hydrogen.
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Keevers Mark John
Turner Adrian Bruce
CSG Solar AG
Gambetta Kelly M
Ostrolenk Faber LLP
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