Heating – Processes of heating or heater operation – Controlling flame position or work atmosphere
Patent
1985-05-03
1986-07-01
Camby, John J.
Heating
Processes of heating or heater operation
Controlling flame position or work atmosphere
34 36, 118 501, 118725, 219400, 432198, 432205, F27B 322, F27B 504, C23C 1400, C23C 1600
Patent
active
045977364
ABSTRACT:
A method and apparatus for heating semiconductor wafers characterized by the release of preheated nitrogen into an oven to considerably reduce heating time for the wafers. The oven is evacuated prior to the release of the preheated nitrogen.
REFERENCES:
patent: 1802000 (1931-04-01), Brooke
patent: 4223048 (1980-09-01), Engle, Jr.
patent: 4347431 (1982-08-01), Pearce et al.
patent: 4375027 (1983-02-01), Zeto et al.
Camby John J.
Hickman Paul L.
Yield Engineering Systems, Inc.
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