Electric heating – Heating devices – Combined with container – enclosure – or support for material...
Patent
1982-05-14
1984-05-15
Reynolds, B. A.
Electric heating
Heating devices
Combined with container, enclosure, or support for material...
219 1043, 219 1049R, 219 1069, 118725, 118 501, 427 451, 427 49, F27B 906, C23C 1308
Patent
active
044490372
ABSTRACT:
A system and method for evenly heating semiconductor wafers in a horizontal elongated reaction tube, wherein a furnace surrounding only a part of the length of the reaction tube is caused to move so as to pass along each wafer placed in the reaction tube. The system is especially useful for processing wafers at high temperatures for a short period of time.
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Kiriseko Tadashi
Onodera Hideo
Shibamata Yoshiyuki
Fujitsu Limited
Leung Philip H.
Reynolds B. A.
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