Furnaces – Process – Incinerating refuse
Patent
1979-12-03
1981-07-21
Favors, Edward G.
Furnaces
Process
Incinerating refuse
110188, 110212, 110214, 110235, 236 15E, 431 76, F23G 502
Patent
active
042792088
ABSTRACT:
A method and apparatus for the heat treatment of industrial wastes wherein at least some of the constituent materials of the wastes are subjected to combustion and/or to pyrolysis to produce flue gases and, in some applications, a residue. The supply of an oxygenated combustion-supporting gas to the wastes is regulated as a function of at least one sensed predetermined characteristic of the flue gases. The oxygenated gas may be a mixture of air and substantially pure oxygen, the feed rate of one or both of these being regulated in response to the sensed temperature and/or oxygen content of the flue gases. Such regulation maintains the oxygen content of the flue gases within the range of from 0 to 7%; and the temperature of the flue gases may be maintained from 400.degree. to 1200.degree. C. and, preferably within a range of 50.degree. C. in this region.
REFERENCES:
patent: 3223058 (1965-12-01), Tanner
patent: 3267890 (1966-08-01), Zinh et al.
patent: 3366080 (1968-01-01), Albertson
patent: 3905312 (1975-09-01), Nichols
patent: 4013023 (1977-03-01), Lombana et al.
patent: 4037543 (1977-07-01), Angelo
patent: 4046086 (1977-09-01), Von Dreusche, Jr.
patent: 4182246 (1980-01-01), Lombana et al.
patent: 4235171 (1980-11-01), Leonard
Guillaume Paul
Karinthi Pierre
Nicolas Jacques
Favors Edward G.
L'Air Liquide Societe Anonyme Pour l'Etude et, l'Exploitation de
Robinson, Jr. Lee C.
LandOfFree
Method and apparatus for heat treatment of industrial wastes does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method and apparatus for heat treatment of industrial wastes, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for heat treatment of industrial wastes will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2432382