Single-crystal – oriented-crystal – and epitaxy growth processes; – Processes of growth from liquid or supercritical state – Having pulling during growth
Patent
1992-02-28
1995-03-07
Breneman, R. Bruce
Single-crystal, oriented-crystal, and epitaxy growth processes;
Processes of growth from liquid or supercritical state
Having pulling during growth
117 25, 117210, C30B 1514
Patent
active
053948254
ABSTRACT:
A high temperature heat exchanger is used with the Czochralski crystal growing method to control the heat extraction from crystal silicon ingots as they are grown. The high temperature heat exchanger also acts as a shaping die so that silicon bars, or ingots, of various shapes, including square, circular, rectangular or ribbon, can be produced by shaping during the growth stage.
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Gorbulev Vladimir
Khattak Chandra P.
Schmid Frederick
Breneman R. Bruce
Crystal Systems Inc.
Garrett Felisa
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