Method and apparatus for generation and implantation of ions

Details Method and apparatus for generation and implantation of ions Method and apparatus for generation and implantation of ions

1994-01-11

1995-05-30

Dzierzynski, Paul M.

Radiant energy

Irradiation of objects or material

Ion or electron beam irradiation

250423R, H01J 2700

Patent

active

054204372

ABSTRACT:
A surface ion source creates a high purity ion beam of molecules of metal compounds having a lower ionization energy than the metal they contain. Low energy dispersion in the ion beam and currents on the order of one ampere are attainable over long duration operation. Rhenium is used in the ion source and related catalyzer. Temperatures vary in the range of 700 to 2500 degrees centigrade and a preferred vacuum pressure of 10.sup.-5 torr, or lower, is used. Wear and corrosion resistance of a wide variety of materials is greatly enhanced through ion deposition and/or implantation with the disclosed apparatus and methods.

REFERENCES:
patent: 3864575 (1975-02-01), Hashmi et al.

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