X-ray or gamma ray systems or devices – Source
Patent
1998-10-21
1999-12-14
Church, Craig E
X-ray or gamma ray systems or devices
Source
378210, H01J 3500
Patent
active
060027444
ABSTRACT:
A method for generating X- or EUV-radiation via laser plasma emission, in which at least one target (17) is generated in a chamber, and at least one pulsed laser beam (3) is focused on the target in the chamber. The target is generated in the form of a jet (17) of a liquid, and the laser beam (3) is focused on a spatially continuous portion of the jet (17). An apparatus for generating X- or EUV-radiation via laser plasma emission according to the method comprises a means for generating at least one laser beam (3), a chamber, a means (10) for generating at least one target (17) in the chamber, and a means (13) for focusing the laser beam (3) on the target (17) in the chamber (8). The target-generating means (10) is adapted to generate a jet (17) of a liquid. The focusing means (13) is adapted to focus the laser beam (3) on a spatially continuous portion of the jet (17).
REFERENCES:
patent: 3416153 (1968-12-01), Hertz et al.
patent: 4161436 (1979-07-01), Gould
patent: 4317994 (1982-03-01), Mallozzi
patent: 4866517 (1989-09-01), Mochizuki et al.
patent: 4953191 (1990-08-01), Smither et al.
patent: 5459771 (1995-10-01), Richardson et al.
patent: 5577092 (1996-11-01), Kublak et al.
Leon J. Radziemski and David A. Cremers, "Laser-Induced Plasmas and Applications", New York and Basel, pp. 295-313.
"X-Ray Lithography, Where it is Now, and Where it is Going", Juan R. Maldonado, Journal of Electronic Materials, vol. 19, No. 7, 1990, pp. 699-709.
"Droplet target for low-debris laser-plasma soft X-ray generation", L. Rymell and H.M. Hertz, Optics Communication, vol. 103, 1990, pp. 105-110.
"Ink-Jet Printing", J. Heinzl, Advances in Electronics and Electron Physics, vol. 65, pp. 91-171.
"Debris-free soft x-ray generation using a liquid droplet laser-plasma target" H.M. Hertz et al., Applications of Laser Plasma Radiation II, Society of Photo-Optical Instrumentation Engineers, vol. 2523, 1995, pp. 88-93.
"Debris-free single-line laser-plasma x-ray source for microscopy", L. Rymell et al. Appl. Phys. Lett. 66 (20), May 15, 1995, pp. 2625-2627.
Berglund Magnus
Hertz Hans M.
Malmqvist Lars
Rymell Lars
Church Craig E
Jettec AB
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