X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Reexamination Certificate
2008-02-01
2010-10-05
Kao, Chih-Cheng G (Department: 2882)
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
Reexamination Certificate
active
07809108
ABSTRACT:
In an X-ray diffraction apparatus, a high brightness source, such as a rotating anode generator, is combined with demagnification X-ray optics to produce a beam with small image size and high-intensity. In one embodiment, an elliptical X-ray optic is positioned relative to the source and image focal points so that the magnification of the optic is less than one. The combination can produce high-intensity beams with beam images at the sample of less than 0.1 mm.
REFERENCES:
patent: 5204887 (1993-04-01), Hayashida et al.
patent: 7245699 (2007-07-01), Verman et al.
Hooft Robertus W. W.
Seijbel Leendert J.
Storm Arjen B.
Bruker AXS Inc.
Kao Chih-Cheng G
Law Offices of Paul E. Kudirka
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