Method and apparatus for generating exposure data of semiconduct

Data processing: generic control systems or specific application – Specific application – apparatus or process – Product assembly or manufacturing

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700118, 700213, 2504922, 25049222, 3955002, 39550022, G06F 1900, G06G 766

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active

059958782

ABSTRACT:
Producing an exposure data used for exposing a design pattern data of a semiconductor integrated circuit on an exposure medium. Repetitive exposure pattern data is extracted from the design pattern data as a group of exposure pattern data. The group of exposure pattern data includes plural pieces of the repetitive exposure pattern data. A rearrangement information table, which includes information for placing the plural pieces of repetitive exposure pattern data in a predetermined rearrangement area, is generated. The design pattern data is rearranged based on the rearrangement information table to generate the exposure data.

REFERENCES:
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patent: 5253182 (1993-10-01), Suzuki
patent: 5337247 (1994-08-01), Hamaguchi
patent: 5432714 (1995-07-01), Chung et al.
patent: 5590048 (1996-12-01), Abe et al.
patent: 5847959 (1998-12-01), Veneklasen et al.

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