Chemistry of inorganic compounds – Halogen or compound thereof – Chlorine dioxide
Patent
1997-10-15
2000-03-28
Powell, William
Chemistry of inorganic compounds
Halogen or compound thereof
Chlorine dioxide
423240R, 422 37, C01B 1102
Patent
active
060428023
ABSTRACT:
The present disclosure relates to a method for generating a volume of chlorine dioxide based sterilant/disinfectant. The method includes the step of generating chlorine dioxide gas, and transferring the chlorine dioxide gas to a sterilization chamber. It also includes the step of monitoring the concentration of chlorine dioxide gas within the sterilization chamber, and terminating the transfer of chlorine dioxide gas to the sterilization chamber when the concentration of chlorine dioxide within the chamber reaches a predetermined level.
REFERENCES:
patent: 4013761 (1977-03-01), Ward et al.
patent: 4250144 (1981-02-01), Ratigan
patent: 4862872 (1989-09-01), Yabe et al.
patent: 5066477 (1991-11-01), Zell et al.
patent: 5110580 (1992-05-01), Rosenblatt et al.
patent: 5227306 (1993-07-01), Eltomi et al.
patent: 5234678 (1993-08-01), Rosenblatt et al.
patent: 5246662 (1993-09-01), Ripley et al.
patent: 5290524 (1994-03-01), Rosenblatt et al.
patent: 5326546 (1994-07-01), Rosenblatt et al.
patent: 5380518 (1995-01-01), Roozdar
patent: 5407656 (1995-04-01), Roozdar
patent: 5618440 (1997-04-01), Mason
patent: 5656248 (1997-08-01), Kline et al.
Kirk-Othmer, "Encyclopedia of Chemical Technology", 4th ed., vol. 5, Carbon and Graphite Fibers to Chlorocarbons and Chlorohydrocarbons-C.sub.1, pp. 968-997 (1993).
Medivators Inc.
Powell William
LandOfFree
Method and apparatus for generating and using chlorine dioxide does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method and apparatus for generating and using chlorine dioxide, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for generating and using chlorine dioxide will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1323510