Method and apparatus for gaseous treatment

Coating processes – Optical element produced – Transparent base

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

4272556, 4273855, 427536, 118500, 118728, B05D 506, C23C 1600

Patent

active

058741275

ABSTRACT:
A fixture device and method for uniformly and efficiently treating an article in a gaseous atmosphere. The fixture device provides a plurality of point contact support locations for supporting the article during the treatment. The fixture device and treatment method are especially useful in the plasma treatment of contact lenses to improve surface biocompatibility and hydrophilicity.

REFERENCES:
patent: 2936222 (1960-05-01), Stevens
patent: 4032440 (1977-06-01), Yaseida
patent: 4137550 (1979-01-01), Kuganowicz et al.
patent: 4312575 (1982-01-01), Peyman et al.
patent: 4501805 (1985-02-01), Yasuda et al.
patent: 4503133 (1985-03-01), van Lier et al.
patent: 4632844 (1986-12-01), Yasuda et al.
patent: 4692347 (1987-09-01), Yasuda
patent: 4749457 (1988-06-01), Yasuda et al.
patent: 4948485 (1990-08-01), Wallsten et al.
patent: 4980196 (1990-12-01), Yasuda et al.
patent: 4981713 (1991-01-01), Yasuda et al.
patent: 4994298 (1991-02-01), Yasuda
patent: 5176938 (1993-01-01), Wallsten et al.
patent: 5182000 (1993-01-01), Antonelli et al.
patent: 5267390 (1993-12-01), Yang et al.
patent: 5270082 (1993-12-01), Lin et al.
patent: 5278384 (1994-01-01), Matsugawa et al.
patent: 5312529 (1994-05-01), Antonelli et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method and apparatus for gaseous treatment does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for gaseous treatment, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for gaseous treatment will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-304620

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.