Method and apparatus for gas measurement at substantially...

Details Method and apparatus for gas measurement at substantially... Method and apparatus for gas measurement at substantially...

2007-07-10

2007-07-10

Williams, Hezron (Department: 2856)

Measuring and testing

Gas analysis

Gas chromatography

Reexamination Certificate

active

11221208

ABSTRACT:
A system which enables the presentation of alternating gas samples to a gas sensor in a detection zone without substantial change of the sample pressure at the sensor in the zone, whereby pressure variations that can produce unwanted sensor signals are mitigated; along with apparatus for facilitating, and a method for implementing, the foregoing.

REFERENCES:
patent: 4019863 (1977-04-01), Jenkins et al.
patent: 4177677 (1979-12-01), Ruzicka et al.
patent: 4316382 (1982-02-01), Woodruff
patent: 4388411 (1983-06-01), Lovelock
patent: RE31438 (1983-11-01), Ueda
patent: 4565086 (1986-01-01), Orr, Jr.
patent: 4902896 (1990-02-01), Fertig et al.
patent: 5187972 (1993-02-01), DeFriez
patent: 5332901 (1994-07-01), Eckles et al.
patent: 5340987 (1994-08-01), Eckles et al.
patent: 5342580 (1994-08-01), Brenner
patent: 5457320 (1995-10-01), Eckles et al.
patent: 6244096 (2001-06-01), Lewis et al.
patent: 6397660 (2002-06-01), Kikuchi et al.
patent: 6467333 (2002-10-01), Lewis et al.
patent: 6550308 (2003-04-01), Kikuchi et al.
patent: 6649129 (2003-11-01), Neal
patent: 6841391 (2005-01-01), Lewis et al.
patent: 2002/0017125 (2002-02-01), Lewis et al.
patent: 2003/0136176 (2003-07-01), Ruiz

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