Method and apparatus for forming thin film and multilayer film

Details Method and apparatus for forming thin film and multilayer film Method and apparatus for forming thin film and multilayer film

1994-10-12

1995-08-22

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

118699, 118705, 118708, 118712, 118 501, C23C 1648

Patent

active

054436460

ABSTRACT:
A thin film is formed on a substrate in a reaction chamber using a photo CVD technique by decomposing a reactive gas supplied to the reaction chamber by means of light irradiated through a light introducing window. The reduction in film deposition rate due to clouding of the light introducing window is corrected in order to form a thin film of a desired film thickness.

REFERENCES:
patent: 4435445 (1984-03-01), Allred et al.
patent: 4836140 (1989-06-01), Koji
patent: 4857139 (1989-08-01), Tashiro et al.
patent: 5005519 (1992-04-01), Egermeier et al.
patent: 5261961 (1993-11-01), Takasu
Appl. Phys. Lett., vol. 41, No. 11, Dec. 1, 1982 (Solanki et al).
Appl. Phys. Lett., vol. 43, No. 5, Sep. 1, 1983 (Solanki et al).

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