Method and apparatus for forming thin film

Details Method and apparatus for forming thin film Method and apparatus for forming thin film

1987-05-08

1990-02-20

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

427 39, 427 47, C23C 1650

Patent

active

049016695

ABSTRACT:
The present invention is directed to a method for forming a thin film on a substrate by the use of a glow discharge plasma which comprises generating a magnetic field in a direction which crosses an electric field for discharge at right angles and fluctuating the magnetic field. The present invention is also directed to an apparatus for practicing the above method, which apparatus is composed of a reaction vessel, means for reducing the pressure in the reaction vessel and means for introducing the feed of reaction gases to the reaction vessel, electrodes for discharge disposed face to face in the reaction vessel, a power source from which a voltage for causing a glow discharge is fed to the electrodes for discharge, a coil surrounding the electrodes for discharge, for generating a magnetic field in a direction crossing at right angles to an electric field generated between the electrodes for discharge, and an AC power source for generating a magnetic field fed to the coil, whereby a thin film is formed on a base plate supported outside the range of the discharge electric field and in parallel with the direction of the electric field.

REFERENCES:
patent: 4825806 (1989-05-01), Tawada
Design Parameters of Large-Scale Horizontal Plasma Furnace, pp. 183-186.

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