Method and apparatus for forming resist pattern, and printed wir

Details Method and apparatus for forming resist pattern, and printed wir Method and apparatus for forming resist pattern, and printed wir

1995-10-12

1997-06-10

Duda, Kathleen

Radiation imagery chemistry: process, composition, or product th

Imaged product

430311, 430319, 430327, 428901, 427 96, G03F 700

Patent

active

056374267

ABSTRACT:
A method for forming a resist pattern comprising the steps of: placing a transparent mask substrate on an object coated with a resist; drawing a mask pattern directly on the transparent mask substrate with an ink jetter; exposing the resist to light with intervention of the mask pattern; peeling off the mask substrate; and developing the resist, thereby forming a predetermined resist pattern.

REFERENCES:
patent: 4767489 (1988-08-01), Lindner
patent: 4853317 (1989-08-01), Hayes
patent: 5466653 (1995-11-01), Ma

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