Method and apparatus for forming pattern on thin substrate...

Details Method and apparatus for forming pattern on thin substrate... Method and apparatus for forming pattern on thin substrate...

2006-05-16

2006-05-16

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Detailed holder for photosensitive paper

C355S077000, C438S014000

Reexamination Certificate

active

07046341

ABSTRACT:
A substrate processing apparatus of the present invention has a retaining base which retains a substrate, a device detecting undulation or thickness unevenness, and a control device which operates the detecting device. The substrate is deformed in a range of a field to be processed, by locally displacing the retaining base on the basis of the detected undulation or thickness unevenness of the substrate. Blurring of an image formed on the substrate can be thereby prevented.

REFERENCES:
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patent: 4737824 (1988-04-01), Sakai et al.
patent: 5724121 (1998-03-01), McKinley et al.
patent: 6529266 (2003-03-01), Sandstrom
patent: 6631557 (2003-10-01), Ogimoto
patent: 63-260129 (1988-10-01), None
patent: 2001-36088 (2001-02-01), None
“Flat-Panel Display 2002”, Separate Vol. of Nikkei Micro Device, pp. 158-161.

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