Method and apparatus for forming optical materials and devices

Radiant energy – Irradiation of objects or material – Ion or electron beam irradiation

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C250S492100, C250S492200

Reexamination Certificate

active

07026634

ABSTRACT:
The invention provides a process for forming optical components and new optical materials utilizing electron beam irradiation. The process comprises selectively irradiating optical materials to alter their index of refraction gradient three dimensionally. With the inventive process, new optical materials can be created that have enhanced optical properties over the un-irradiated material. The invention also provides a process in which optical components can be fabricated without requiring a planar/multiple layer process, thereby simplifying the fabrication of these optical components. The inventive process uses a controlled electron beam to alter the properties of optical materials. By using the radiation of a controlled electron beam, controlled changes in the index of refraction gradient of optical materials can be obtained. Further, radiation of the electron beam can be used to create new optical materials from materials not previously believed to be suitable for optical applications. This is based not only on the refractive index change created in the material, but also upon the change in other material properties such as elimination of melt and reduced solubility in normal solvents. In these cases, the electron beam modifies and creates a new networks structure within the material, which enhances its optical properties and allows for the formation of useful physical properties necessary for the fabrication of useful devices (i.e., resulting in wholly new optical materials). It is also disclosed that the inventive process can be used to produce a spatially graded index of refraction within a material to enhance the performance of an optical waveguide which can lead to a number of novel structures.

REFERENCES:
patent: 4808285 (1989-02-01), Chen et al.
patent: 5003178 (1991-03-01), Livesay
patent: 5101297 (1992-03-01), Yoshida et al.
patent: 5108201 (1992-04-01), Matsuura et al.
patent: 5271082 (1993-12-01), Braglia et al.
patent: 5291575 (1994-03-01), Yanagawa et al.
patent: 5376586 (1994-12-01), Beilin et al.
patent: 5572619 (1996-11-01), Maruo et al.
patent: 5598501 (1997-01-01), Maruo et al.
patent: 5770826 (1998-06-01), Chaudhari et al.
patent: 6132814 (2000-10-01), Livesay et al.
patent: 6306563 (2001-10-01), Xu et al.
patent: 6407399 (2002-06-01), Livesay
patent: 6607991 (2003-08-01), Livesay et al.
Nakayama et al, Nonlinear optical waveguide fabrication by direct electron beam irradiation andthermal development using a high Tg polymer, 1997, Annual Physics Letters, 71, p. 1924-1926.
T. Suhara et al., “Electron Beam induced Refractive Index . . . ” Japanese Journal of Applied Physics, 1975, vol. 14, No. 7, pp. 1079-1080.
A. Houghton et al., “Optical Waveguide formed by low energy irradiation . . . ” Applied Physics Letters, 1976, vol. 29, No. 9, pp. 565-566.
T. Suhara et al., “Temporary Absorption of Guided Light . . . ” Japanese Journal of Applied Physics, 1977, vol. 16, No. 10, pp. 1877-1878.
H. Kotani et al., “Direct Writing of Gratings by Electron Beam . . . ” Japanese Journal of Applied Physics, 1979, vol. 18, No. 2, pp. 279-283.
M. Rooks et al., “Polyimide optical waveguides . . . ” Applied optics, 1990, vol. 29, No. 27, pp. 3880-3882.
S. Madden et al., Optical channel waveguide fabrication Applied Physics Letters, 1990, vol. 57, No. 27, pp. 2902-2903.
R. Syms et al., “near Infrared Channel Waveguide . . . ”, Journal of Lightwave Technology, 1994, vol. 12, No. 12, pp. 2085-2091.
R. Syms et al., “Low-Loss Near-Infrared Passive . . . ” Journal of Lightwave Technology, 1995, vol. 13, No. 8 pp. 1745-1749.
Y. Maruo et al., Embedded channel polyimide waveguide . . . Journal of Lightwave Technology, 1995, vol. 13, No. 8, pp. 1718-1723.
Y. Maruo et al., “Channel optical waveguide fabrication . . . ” Applied Optics, 1995, vol. 34, No. 6, pp1047-1052.
H. Nakayama et al., “Non-linear optical waveguide . . . ” Applied Physics Letters, 1997, vol. 71, No. 14, pp. 1924-1926.
N.Nordman et al., “Characterization of refractive index change . . . ” Journal of Applied Physics, 1997, vol. 82, No. 4, pp. 1521-1524.
H. Nakayama et al., “Fabrication Technique . . . ”, Applied Optics, 1998, vol. 37, No. 7, pp. 1213-1219.
A. Nakao et al., “Electron Beam writing fabrication . . . ”. Japanese Journal of Applied Physics, 1998, vol. 3 Part 1, No. 3A, pp. 845-846.
A. Syahriar, “Thermo-optic Interferometric . . . ”. Journal of Lightwave Technology, 1998, vol. 16, No. 5, pp. 841-846.
S. Spaargaren et al., “Characterization of defects . . . ” Journal of Lightwave Technology, 2000, vol. 18, No. 4, pp. 555-561.
W. Wong et al., Low-loss polymeric optical waveguides . . . Applied Physics Letters, 2001, vol. 78, No. 15, pp. 2110-2112.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method and apparatus for forming optical materials and devices does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for forming optical materials and devices, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for forming optical materials and devices will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3560738

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.