Method and apparatus for forming films from vapors using a conta

Batteries: thermoelectric and photoelectric – Photoelectric – Cells

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118 501, 204164, 427 38, 427 84, 427 95, H01L 3104

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active

042687110

ABSTRACT:
Method for forming mixed oxide and/or nitride films upon the surface of an article by the use of a partially confined plasma-activated source. The plasma-activated source has a cavity in which an RF field is formed within the cavity to create a gas plasma in the cavity as gas is introduced into the cavity. The gas plasma is caused to exit from the cavity to impinge upon the surface of the article to be coated. At least one of the constituents of the film is selected as a compound vapor and is chemically reacted with at least one other constituent by utilization of the gas plasma to form the thin film on the surface of the article while the article is maintained at a low temperature. A chemical reaction takes place within the cavity itself and/or alternatively at the surface to be coated for the formation of the films.

REFERENCES:
patent: 3801355 (1974-04-01), Van Cakenberghe
patent: 4086102 (1978-04-01), King
patent: 4099986 (1978-07-01), Diepers
patent: 4123316 (1978-10-01), Tsuchimoto
patent: 4138306 (1979-02-01), Niwa
Hecq et al., "Thin Solid Films", vol. 12, No. 2, 1972, pp. 453-456.

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