Coating apparatus – Gas or vapor deposition – With treating means
Patent
1997-09-09
2000-02-29
Bueker, Richard
Coating apparatus
Gas or vapor deposition
With treating means
118725, 118726, C23C 1600
Patent
active
06030460&
ABSTRACT:
Disclosed is a method and apparatus for facilitating the decomposition of organometallic compounds such as TEOS in chemical vapor deposition reactors in order to form deposition films. The method generally includes: (1) introducing an organometallic compound and ozone molecules to a chemical vapor deposition reactor; (2) directing ultraviolet radiation into the chemical vapor deposition reactor to increase the rate at which oxygen atoms are formed from the ozone molecules present in the chemical vapor deposition reactor; and (3) decomposing the organometallic compound to form a deposition layer. The organometallic compound decomposes at an accelerated rate due in part to an increased amount of hydroxyl radicals present in the chemical vapor deposition reactor.
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Bueker Richard
LSI Logic Corporation
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