Hydraulic and earth engineering – Fluid control – treatment – or containment – Flow control
Patent
1998-06-10
1999-12-21
Bagnell, David
Hydraulic and earth engineering
Fluid control, treatment, or containment
Flow control
404 2, 249 10, E02B 500
Patent
active
060040688
ABSTRACT:
A method and apparatus for forming a trench or catch basin void with removable cardboard components that fold up to create a three dimensional trench void form, and pair of elongated frame members to define a support surface for a trench cover is disclosed according to the present invention. The removable cardboard form includes a rectangular shape with outwardly extending edges running longitudinally along the top surface. A pair of elongated frame members lay in a coplanar, spaced relationship to the side and bottom of the outward extended top edges of the predetermined form. The frames are used to define a surface to support the trench covers. A pair of U shaped support legs are joined at the ends to the frame members with nuts in order to maintain clearance for total encasement and adjust the top of the form to the desired finish elevation. Another preferred embodiment utilizes a rectangular rail for creating a drain support in a finished catch basin.
REFERENCES:
patent: 5000621 (1991-03-01), Beamer
patent: 5066165 (1991-11-01), Wofford et al.
patent: 5281051 (1994-01-01), Stegall
patent: 5399047 (1995-03-01), Stegall
patent: 5538361 (1996-07-01), Beamer
patent: 5573350 (1996-11-01), Stegall
patent: 5782049 (1998-07-01), Gates et al.
patent: 5799455 (1998-09-01), Gates et al.
Bagnell David
Lagman Frederick
LandOfFree
Method and apparatus for forming a trench or catch basin void does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method and apparatus for forming a trench or catch basin void, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for forming a trench or catch basin void will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-499201