Method and apparatus for forming a pattern, device and...

Data processing: measuring – calibrating – or testing – Calibration or correction system – Position measurement

Reexamination Certificate

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Details

C702S183000, C347S019000

Reexamination Certificate

active

11027921

ABSTRACT:
A method for forming a pattern on a substrate, including the steps of: ejecting liquid drops from an ejection head having nozzles onto a reference plate on which a plurality of target positions are defined, the target positions being arranged in at least one row; detecting an amount of a displacement between the target positions and the positions at which the liquid drops have actually landed; determining a relative positional error relative to the ejection head for each of the at least one row of the target positions based on the amount of the displacement; determining a correction value for each of the at least one row based on the relative positional error; and sequentially changing a relative position of the substrate and the ejection head based on the corrections values when the liquid drops are being ejected onto the substrate.

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Communication from Japanese Patent Office regarding counterpart application.

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