Method and apparatus for forming a diamond film

Details Method and apparatus for forming a diamond film Method and apparatus for forming a diamond film

1990-07-03

1992-03-31

Bueker, Richard

Coating apparatus

Control means responsive to a randomly occurring sensed...

Temperature responsive

118723, 118725, 118712, 118729, C23C 1648

Patent

active

050997882

ABSTRACT:
A method and apparatus for forming a diamond film, has a casing in which vacuum is maintained at a predetermined value. A substrate is disposed within the casing so that the diamond film is formed thereon. A gas plasma generator for generating a gas plasma near the substrate from a plasma source gas and a carbon source gas by an arc discharge is provided within the casing. A detector detects a factor which is related to a change in a surface temperature of the diamond film, and an electronic controller controls in response to the detected factor the surface temperature of the diamond film so as to maintain such temperature near a predetermined optimal value for forming the diamond film. As the surface temperature is maintained near the optimal value by a feedback control, high purity diamond film is obtained irrespective of the thickness or the forming time thereof.

REFERENCES:
patent: 3980042 (1976-09-01), Stut
patent: 4767608 (1988-08-01), Matsumoto
patent: 4851254 (1989-07-01), Yamamoto
patent: 4883560 (1989-11-01), Ishihara
patent: 4981671 (1991-01-01), Moriyoshi
Bachmann, Diamond Thin Films, Chemical and Engineering News, May 15, 1989, pp. 24-39.

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