Method and apparatus for forming a deposited layer on a skirted

Details Method and apparatus for forming a deposited layer on a skirted Method and apparatus for forming a deposited layer on a skirted

1992-01-29

1993-08-17

Beck, Shrive

Coating apparatus

Gas or vapor deposition

Having means to expose a portion of a substrate to coating...

118720, 118730, 427 69, 427237, 4272555, C23C 1604

Patent

active

052365107

ABSTRACT:
The thickness distribution of a vapor deposited layer such as an interference filter deposited on a skirted substrate such as a glass faceplate for a projection television tube, is improved by shielding the substrate from indirect flux of vapor so as to reduce the shadowing effect of the skirt upon the thickness distribution of the deposited layer thereby improving the white field uniformity of the resultant projection image.

REFERENCES:
patent: 4380212 (1983-04-01), Kraus
patent: 4449478 (1984-05-01), Kraus
patent: 4982695 (1991-01-01), Brennesholtz et al.

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