Method and apparatus for focusing a wafer stepper

Details Method and apparatus for focusing a wafer stepper Method and apparatus for focusing a wafer stepper

1990-04-20

1991-09-17

Brown, Brian W.

Photocopying

Projection printing and copying cameras

Step and repeat

355 77, G03B 2742

Patent

active

050499254

ABSTRACT:
A reticle for use in a wafer stepper of the type in which a lens projects the image of a mask to create a lithographically-defined pattern on a wafer. The reticle includes a plurality of parallel, opaque rectangles formed therein. The rectangles are uniform in size with the width of each rectangle bearing a ratio to the distance between adjacent rectangles of approximately 4:1.

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patent: 4740678 (1988-04-01), Horikawa
patent: 4759626 (1988-07-01), Kroko
patent: 4963924 (1990-10-01), Gill et al.

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