Method and apparatus for fluid polishing

Details Method and apparatus for fluid polishing Method and apparatus for fluid polishing

2008-09-23

2008-09-23

Wilson, Lee D. (Department: 3723)

Abrading

Abrading process

Utilizing fluent abradant

C451S008000, C451S061000, C451S104000, C073S607000

Reexamination Certificate

active

11509749

ABSTRACT:
In a fluid polishing method for processing a fine aperture by slurry7,the slurry is supplied from a cylinder2ain a slurry flow rate target process until the flow rate increases to a target value of a slurry feed flow rate. When the flow rate reaches the target flow-rate, the cylinder is stopped and switched to another cylinder2band the operation fluid flow rate of the fine aperture is thereafter measured. In a metering process, to be executed next, a necessary processing time is calculated on the basis of the operation fluid flow rate and polishing is carried out for a necessary processing time by another cylinder2b. Another cylinder is then stopped and switched and the operation fluid flow rate is measured. In this way, the metering process is repeated until the operation fluid flow rate reaches a predetermined value. In each process, the supply of the slurry is not interrupted.

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Office Action dated Nov. 29, 2006 in German Application No. 10 2006 040 219.7-14 with English translation.

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