Optical: systems and elements – Protection from moisture or foreign particle – Fluid directed across optical element
Reexamination Certificate
2006-10-31
2006-10-31
Dang, Hung Xuan (Department: 2873)
Optical: systems and elements
Protection from moisture or foreign particle
Fluid directed across optical element
C359S507000
Reexamination Certificate
active
07128427
ABSTRACT:
Apparatus and method for a substantially distortion free immersion lithography is provided. The apparatus includes a lens element, an outlet for drawing immersion fluid towards the lens element, and a collector ring coupled to the central outlet for removing the immersion fluid. The method includes positioning a lens element relative to a wafer to provide a space between the lens element and wafer, introducing immersion fluid to that space, and drawing the immersion fluid from that space to minimize gas bubbles in the immersion fluid, and repeating the introducing and drawing steps to maintain the flow of the immersion fluid during a lithography process.
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Trybula Walter J.
Van Peski Christian K.
Dang Hung Xuan
Fulbright & Jaworski LLP
Martinez Joseph
Sematech Inc.
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