Method and apparatus for filter conditioning

Details Method and apparatus for filter conditioning Method and apparatus for filter conditioning

2011-06-28

2011-06-28

Smith, Duane (Department: 1776)

Liquid purification or separation

Flow, fluid pressure or material level, responsive

Fluid current controlled cyclic system

C210S090000, C210S143000, C210S195100, C210S196000, C210S416100, C210S418000

Reexamination Certificate

active

07967978

ABSTRACT:
An apparatus for preconditioning a filter media includes a reservoir containing a liquid; a pump operatively connected and in fluid communication with the reservoir; a filter housing operatively connected and in fluid communication with the reservoir and the pump, and having a filter media disposed therein; a control unit operatively connected to the pump; and wherein the pump is operable to circulate the liquid through the filter media to wet and remove air from the filter media prior to installation of the filter media in a processing application.

REFERENCES:
patent: 6425497 (2002-07-01), Chu et al.
Entegris, Inc., Intelligen Mini Dispense System, Advanced two-stage technology delivers ultimate defect reduction in point-of-use photochemical dispense, Copyright Mar. 2006 Entegris, Inc., 5 pages.
Mutsuhiro Amari, et al., Effect of Filter Surface Chemistry and Morphology on 193 nm Lithography Applications, SEMICON Korea 2005 Mykrolis Corproation, 9 pages.
Phong Do, et al., Optimized filtration for reduced defectivity and improved dispense recipe in 193 nm BARC lithography, Copyright 2004 Society of Photo-Optical Instrumentation Engineers, 8 pages.

Affiliated with

Also associated with

Rating

Method and apparatus for filter conditioning does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for filter conditioning, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for filter conditioning will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2737958