Method and apparatus for film thickness measurement

Details Method and apparatus for film thickness measurement Method and apparatus for film thickness measurement

2006-10-31

2006-10-31

Glick, Edward J. (Department: 2882)

X-ray or gamma ray systems or devices

Specific application

Diffraction, reflection, or scattering analysis

C378S070000

Reexamination Certificate

active

07130373

ABSTRACT:
The thickness of a thin film can be measured based on the X-ray diffraction method. An X-ray is allowed to be incident upon a surface of the thin film. An intensity of a diffracted X-ray is measured with the incident angle α being changed to obtain a measured rocking curve. On the other hand, a theoretical rocking curve is calculated in consideration of an orientation density distribution function ρ of the thin film. A scale factor is predetermined for a standard sample having a known film thickness. A parameter fitting operation is carried out in a manner that the characteristic parameter of the function ρ and the film thickness t are adjusted so that the theoretical rocking curve including the scale factor can approach the measured rocking curve as closely as possible.

REFERENCES:
patent: 6873681 (2005-03-01), Toraya et al.
patent: 04-194611 (1992-07-01), None
patent: 10-038821 (1998-02-01), None
patent: 10-103942 (1998-04-01), None
patent: 2000-088776 (2000-03-01), None
H. Toraya et al: “Quantitative basis for the rocking-curve measurement of preferred orientation in polycrystalline thin films”, Journal of Applied Crystallography, ISSN 0021-8898, Feb. 7, 2003, International Union of Chrystallography, Great Britain, 2003; pp. 890-897.

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