Method and apparatus for filling high density vias

Powder metallurgy processes – Powder metallurgy processes with heating or sintering – Making composite or hollow article

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419 57, 419 60, B22F 300, B22F 700

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active

049543130

ABSTRACT:
A method for providing void-free low-electrical-resistance conductive cores in vias having an aspect ratio of greater than approximately 6 includes the steps of providing a conductive thixotropic paste on the top surface of a substrate having vias provided therein, applying pressure to the paste and concurrently applying pressure to the paste and bottom surface of the substrate to force the thixotropic paste into the vias. Vibratory motion may also be applied to the substrate and paste concurrently with the application of pressure and vacuum. The paste is then dried in a vacuum, and subsequently sintered in a two-step process including a slow ramp up to temperature to allow the paste to outgas followed by a high temperature treatment.

REFERENCES:
patent: 3561110 (1971-02-01), Fuelner et al.
patent: 4024629 (1977-05-01), Lemoine et al.
patent: 4434134 (1984-02-01), Darrow et al.
patent: 4671928 (1987-06-01), Herron et al.

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