Method and apparatus for facilitating proximity...

Semiconductor device manufacturing: process – Packaging or treatment of packaged semiconductor – Assembly of plural semiconductive substrates each possessing...

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C438S107000, C438S109000, C438S118000, C438S613000, C257S685000, C257S686000, C257S777000, C257S778000, C257SE21503, C257SE21514, C257SE23004, C257SE23010

Reexamination Certificate

active

07888175

ABSTRACT:
The described embodiments provide a system that facilitates inter-chip alignment for proximity communication and power delivery. The system includes a first integrated circuit chip and a second integrated circuit chip, both of which whose surfaces have corresponding etch pit wells configured to align with each other. A shaped structure is placed in an etch pit well of the first integrated circuit chip such that when the corresponding etch pit well of the second integrated circuit chip is substantially aligned with the etch pit well of the first integrated circuit chip, the shaped structure mates with both the etch pit well of the first integrated circuit chip and with the corresponding etch pit well of the second integrated circuit chip, thereby aligning the first integrated circuit chip with the second integrated circuit chip. In some embodiments the etch pit wells include conductive structures for routing power through a conductive shaped structure.

REFERENCES:
patent: 5319725 (1994-06-01), Buchmann et al.
patent: 6500696 (2002-12-01), Sutherland
patent: 6555917 (2003-04-01), Heo
patent: 2008/0230263 (2008-09-01), En
R.J. Drost et al., “Proximity communications”, Proc. IEEE Custom Integrated Circuits Conference (CICC-2003), pp. 469-472, Sep. 2003.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method and apparatus for facilitating proximity... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for facilitating proximity..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for facilitating proximity... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2637932

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.