Single-crystal – oriented-crystal – and epitaxy growth processes; – Apparatus
Patent
1999-12-28
2000-09-19
Utech, Benjamin L.
Single-crystal, oriented-crystal, and epitaxy growth processes;
Apparatus
117202, 117206, 117223, 117902, 117931, C30B 3500, C30B 1700
Patent
active
061206024
ABSTRACT:
An apparatus and a method for producing single crystal semiconductor particulate in near spherical shape and the particulate product so formed is accomplished by producing uniform, monosized, near spherical droplets; identifying the position of an undercooled droplet in a nucleation zone; and seeding the identified droplet in the nucleation zone to initiate single crystal growth in the droplet.
REFERENCES:
patent: 3998659 (1976-12-01), Wakefield
patent: 3999950 (1976-12-01), Nagorsen
patent: 4021323 (1977-05-01), Kilby et al.
patent: 4322379 (1982-03-01), Kilby et al.
patent: 4354987 (1982-10-01), Iya
patent: 4425408 (1984-01-01), Levine et al.
patent: 4430150 (1984-02-01), Levine et al.
patent: 4582534 (1986-04-01), Torobin
patent: 4637855 (1987-01-01), Witter et al.
patent: 4643587 (1987-02-01), Makabe et al.
patent: 4806357 (1989-02-01), Garret et al.
patent: 5028546 (1991-07-01), Hotchkiss
patent: 5069740 (1991-12-01), Levine et al.
patent: 5227239 (1993-07-01), Upadhye et al.
patent: 5269637 (1993-12-01), Gomes, Jr.
patent: 5352269 (1994-10-01), McCandlish et al.
patent: 5420744 (1995-05-01), Asada et al.
patent: 5431127 (1995-07-01), Stevens et al.
patent: 5614020 (1997-03-01), Stevens et al.
Cochrane, R.F. et al., "Containerless solidification of alloys in a drop-tube", Material Science Engineering vol. 98:99-103, 1988.
Madelung, O. et al. (Eds.), "Semiconductors: Technology of III-V. II-VI and non-tetrahedrally-bonded compounds", Landold-Bornstein, vol. 17d (New York: Springer-Verlag):27, 1984.
Lide, David R. et al. (Ed.), "CRC Handbook of Chemistry and Physics", 71st Ed. (Cleveland, OH: Chemical Rubber Pub. Co.): 1254-1256, 1990.
Belcher Jessica
Miller Steven A.
Stephens Matthew D.
Champagne Donald L.
Starmet Corporation
Utech Benjamin L.
LandOfFree
Method and apparatus for fabricating near spherical semiconducto does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method and apparatus for fabricating near spherical semiconducto, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for fabricating near spherical semiconducto will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1068468