Method and apparatus for fabricating near spherical semiconducto

Single-crystal – oriented-crystal – and epitaxy growth processes; – Processes of growth from liquid or supercritical state – Havin growth from molten state

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117 74, 117 75, 117 76, 117920, 117931, 75340, 75341, 75363, C30B 1700, B22F 906

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active

061066141

ABSTRACT:
An apparatus and a method for producing single crystal semiconductor particulate in near spherical shape and the particulate product so formed is accomplished by producing uniform, monosized, near spherical droplets; identifying the position of an undercooled droplet in a nucleation zone; and seeding the identified droplet in the nucleation zone to initiate single crystal growth in the droplet.

REFERENCES:
patent: 3099041 (1963-07-01), Kaufmann
patent: 3998659 (1976-12-01), Wakefield
patent: 5420744 (1995-05-01), Asada et al.

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