Method and apparatus for fabricating a carbon nanotube...

Nanotechnology – Nanostructure – Devices having flexible or movable element

Reexamination Certificate

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C257S020000

Reexamination Certificate

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07141727

ABSTRACT:
A method of fabricating a nanotube field-effect transistor having unipolar characteristics and a small inverse sub-threshold slope includes forming a local gate electrode beneath the nanotube between drain and source electrodes of the transistor and doping portions of the nanotube. In a further embodiment, the method includes forming at least one trench in the gate dielectric (e.g., a back gate dielectric) and back gate adjacent to the local gate electrode. Another aspect of the invention is a nanotube field-effect transistor fabricated using such a method.

REFERENCES:
patent: 2003/0178617 (2003-09-01), Appenzeller et al.
patent: 2004/0036128 (2004-02-01), Zhang et al.
“Polymer Functionalization for Air-Stable n-Type Carbon Nanotube Field-Effect Transistors”, Shim et al., J. Am. Chem. Soc., 2001, vol. 123, pp. 11512-11513.
Heinze et al., Appl. Phys. Lett., “Electrostatic Engineering of Nanotube Transistors for Improved Performance” vol. 83, pp. 5038-5040; Dec. 15, 2003.
Wind et al., Phys. Rev. Lett., “Lateral Scaling in Carbon-Nanotube Field-Effect Transistors” vol. 91, pp. 058301-1 to 058301-4; Aug. 2003.
Javey et al., Nature Materials, “High-k Dielectrics for Advanced Carbon-Nanotube Transistors and Logic Gates” vol. 1, pp. 241-246; Dec. 2002.
Bachtold et al., Sciencexpress, “Logic Circuits with Carbon Nanotube Transistors” pp. 1-4 ( plus figures ); Oct. 2001.
Lin et al., Nano Letters, “Ambipolar-to-Unipolar Conversion of Carbon Nanotube Transistors by Gate Structure Engineering” vol. 4; Mar. 2004.
Lin et al., Device Research Conference Abstract, Conference Digest; “Novel Structures Enabling Bulk Switching in Carbon Nanotube FET”; Jun. 2004.

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