Method and apparatus for exposure process

Details Method and apparatus for exposure process Method and apparatus for exposure process

1992-06-16

1994-03-29

Messimber, Michael

Radiant energy

Photocells; circuits and apparatus

Photocell controls its own optical systems

356401, G01N 2186, G01B 1100

Patent

active

052987612

ABSTRACT:
In the manufacture of a device having a relatively large area, e.g., a liquid crystal device by a lithographic technique, using at least one of a plurality of original images and defining an exposed pattern by each original image as an individual subdivision area, the position of a substrate is changed relatively upon exposure of every subdivision area to expose on the substrate a composite exposed pattern of a relatively large area composed of the plurality of abutting and combined subdivision areas. When aligning each of the original images with the substrate in accordance with predetermined target position information, the amounts of relative deviation at the abutting portions of the subdivision areas (i.e., stitching errors) are preliminarily determined and compensating values tending to reduce each of the stitching errors to less than a given tolerance value are added to the target position information, thereby effecting the alignment. Thus, the stitching accuracy is improved for the composite pattern on the whole.

REFERENCES:
patent: 4878086 (1989-10-01), Isohata et al.
patent: 4900939 (1990-02-01), Aoyama
patent: 4918320 (1990-04-01), Hamasaki et al.
patent: 5017514 (1991-05-01), Nishimoto
patent: 5153678 (1992-10-01), Ota
patent: 5225686 (1993-07-01), Edo
patent: 5243195 (1993-09-01), Nishi

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