Method and apparatus for exposure of substrates

Details Method and apparatus for exposure of substrates Method and apparatus for exposure of substrates

1993-03-05

1996-02-27

Reinhart, Mark J.

Incremental printing of symbolic information

Light or beam marking apparatus or processes

Scan of light

H04N 121

Patent

active

054952794

ABSTRACT:
A method for exposure of patterns described in one or several databases containing geometrical descriptions of said patterns by means of writing with a focussed laser light onto substrates which are photosensitive at the wavelength of the laser light, comprising the steps of

REFERENCES:
patent: 3861804 (1975-01-01), Lehmbech
patent: 3938191 (1976-02-01), Jarmy
patent: 4464030 (1984-08-01), Coale et al.
patent: 4727381 (1988-02-01), Bille et al.
patent: 5027132 (1991-06-01), Manns et al.

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