Method and apparatus for exposing photosensitive materials

Details Method and apparatus for exposing photosensitive materials Method and apparatus for exposing photosensitive materials

1994-06-21

1996-11-12

Wright, Lee C.

Radiation imagery chemistry: process, composition, or product th

Plural exposure steps

430584, 430944, 430945, 3461351, 347232, 347241, 347243, 347264, G03C 170, H04N 141, H04N 158

Patent

active

055738940

ABSTRACT:
An apparatus for exposing photosensitive materials includes a plurality of light sources for generating beams having different wavelengths, a polygon mirror for scanning and exposing the beams toward a color photosensitive material, and one or more f.theta. lenses disposed on an optical path between the photosensitive material and the polygon mirror. The polygon mirror and the f.theta. lenses are arranged, with respect to the beam from a light source having an intermediate wavelength among the light sources, such that reflection points corresponding to both ends of beam scanning on reflection surfaces of the polygon mirror pass through an identical point on an optical axis of the f.theta. lenses, and light beams at the both ends of beam scanning have line symmetry with respect to the optical axis of the f.theta. lenses.

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